Phase analysis in alpha-Fe after high-dose Si ion implantation by depth-selective conversion-electron Mössbauer spectroscopy (DCEMS)


Phase analysis in alpha-Fe after high-dose Si ion implantation by depth-selective conversion-electron Mössbauer spectroscopy (DCEMS)

Walterfang, M.; Kruijer, S.; Dobler, M.; Reuther, H.; Keune, W.

Si+ ions of 50 keV in energy were implanted into a-Fe (95% 57Fe) with a nominal dose of 5x10E17 cmE-2.

  • Hyperfine Interactions 126 (2000) 219-222

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Publ.-Id: 3731