Plasma immersion Ion implantation of TiAl using Chlorine containing plasma


Plasma immersion Ion implantation of TiAl using Chlorine containing plasma

Hornauer, U.; Richter, E.; Wieser, E.; Möller, W.; Donchev, A.; Schütze, M.

In order to apply the protective effect of Cl doping on the high temperature oxidation resistance of TiAl alloys for complicated shaped parts, plasma immersion ion implantation (PI3) of chlorine into technical TiAl alloys was investigated. A specialized PI3 apparatus was optimized for the strongly etching electronegative Cl plasma. Plasma diagnostics was performed using a Langmuir probe. In order to sustain a sufficient dense plasma, different RF- antenna configurations are discussed and the resulting densities are compared. The influence of plasma pulsing on the surface interaction of Cl during the process is evaluated.
Different commercial alloys were implanted and tested. The resulting depth profiles of the modified surface layer are investigated using depth profiling with Auger electron spec-troscopy (AES). After implantation, the Cl is located close to the surface. Oxidation tests at 900°C in air for 100 h showed a strong reduction of the oxidation, which is comparable to conventional beam line im-plantations of Cl. The effect is rather independent of the alloy composition and therefore interesting for application.
ing depth profiles of Cl are investigated using depth profiling with Auger electron spectroscopy (AES). After treatment, the Cl is located close to the surface. The retained dose depends mainly on the temperature during implantation, which is controlled by the repetition rate of the pulses. Oxidation tests at 900°C in air for 100 h showed a strong reduction of the oxidation, which are comparable to conventional beam line im-plantations of Cl. The effect is rather independent of the alloy composition and therefore interesting for ap-plication.

Keywords: PIII; Chlorine; Oxidation; TiAl

  • Lecture (Conference)
    Plasma Surface Engineering, PSE2002, Garmisch-Partenkirchen, Germany, 9.-13. Sept. 2002
  • Surface and Coatings Technology 173-174 (2003) 1182-1186
  • Contribution to external collection
    Plasma Surface Engineering, PSE2002, Garmisch-Partenkirchen, Germany, 9.-13. Sept. 2002

Permalink: https://www.hzdr.de/publications/Publ-4347
Publ.-Id: 4347