Density gradient in SiO2 films on silicon as revealed by positron annihilation spectroscopy
Density gradient in SiO2 films on silicon as revealed by positron annihilation spectroscopy
Revesz, A. G.; Anwand, W.; Brauer, G.; Hughes, H. L.; Skorupa, W.
no abstract delivered from author
Keywords: kein
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Lecture (Conference)
32nd Semiconductor Interface Specialists Conference, Washington/DC, USA, Nov 29 - Dec 01, 2001
Permalink: https://www.hzdr.de/publications/Publ-4811
Publ.-Id: 4811