Plasmonic structures fabricated by focused ion beams


Plasmonic structures fabricated by focused ion beams

Bischoff, L.; Schmidt, B.; Heinig, K.-H.; Müller, T.; Hellwig, S.

A mass selected focused ion beam is employed for the fabrication of plasmonic structures applying different techniques. So the local implantation of equidistant gold-dots of some ten nm diameter in a silicon or SiO2 target will be studied. Also the local growth of Au-dots after a FIB pre-treatment is a promising approach due to the low adhesion of Au on Si and SiO2 surfaces. Dots or columns can also be achieved by sputtering small holes in a thin film and filling them with noble metals. A new approach is the local ion beam synthesis of CoSi2 nano-structures after cobalt-FIB implantation and annealing. An additional possibility is the growth of metal structures in a FIB aided CVD process using a certain precursor metal-organic gas.

Keywords: Focused Ion Beam; Ion Beam Synthesis; Direct Patterning; FIB aided CVD

  • Poster
    International Workshop on Nanostructures for Microelectronics and Optics -NEOP- Oct. 6 - 9, 2002, Dresden, Germany
  • Contribution to proceedings
    International Workshop on Nanostructures for Microelectronics and Optics -NEOP- Oct. 6 - 9, 2002, Dresden, Germany

Permalink: https://www.hzdr.de/publications/Publ-4959
Publ.-Id: 4959