Electrochemical behaviour of bimetallic Ni-Ti surface generated by ion implantation


Electrochemical behaviour of bimetallic Ni-Ti surface generated by ion implantation

Pham, M. T.; Maitz, M.; Reuther, H.; Richter, E.; Matz, W.; Muecklich, A.; Prokert, F.

Thin films NiTi (< 100 nm) having surface Ni content below 5 at. % were prepared by ion implanting Ni into Ti surfaces. The Ni containing phase exposed or buried within the Ti matrix was amorphous. Following an anodic oxidation in NaOH the material was shown to be redox active and promote the electrocatalytic oxidation of glucose depending on the surface NiTi composition. Compared to the NiTi bulk alloy (55.9:44.08) the Ni implanted Ti displayed a more efficient catalytic activity and improved corrosion resistance.

Keywords: Ionenimplantation; Katalyse; NiTi-Legierung

  • Journal of Materials Research 19(2004), 439-446

Permalink: https://www.hzdr.de/publications/Publ-5492
Publ.-Id: 5492