The Kinetics of the Ion-Beam-Induced Interfacial Amorphization in Silicon, Seite 5360, Manuskript-Nr.: 015721 JAP


The Kinetics of the Ion-Beam-Induced Interfacial Amorphization in Silicon, Seite 5360, Manuskript-Nr.: 015721 JAP

Henkel, T.; Heera, V.; Kögler, R.; Skorupa, W.; Seibt, M.

  • Journal of Applied Physics, 82 (11), 1 December 1997, S. 5360-5373

Permalink: https://www.hzdr.de/publications/Publ-785
Publ.-Id: 785