X-ray investigations on NiMn films after ion beam irradiation


X-ray investigations on NiMn films after ion beam irradiation

Cantelli, V.; von Borany, J.; Grenzer, J.

Magnetron sputtered film stacks of 5nm Ta/50(15)nm NiMn/20nm Fe19Ni81 /5nm Ta deposited at Si/SiO2 substrates were subsequently irradiated with He+ ions (30 keV, 1e15 - 3e16 cm-2). Using synchrotron X-ray diffraction and reflectivity, the transition from the paramagnetic NiMn phase to the chemically ordered, antiferromagnetic L10 phase during annealing was studied. The transformation to a dominating L10 ordered NiMn film takes place between 300-400°C irrespective of the irradiation. Ion irradiation at low fluences offers beneficial effects with respect to a reduction of the mosaicity for both, the NiMn and the permalloy film, and a smoothening of internal interfaces.

Keywords: magnetron sputtering; magnetic films; L10 ordering; ion irradiation

  • Lecture (Conference)
    6th Autumn School on X-ray Scattering from Surfaces and Thin Layers, 18.-21.09.2005, Smolenice, Slovakia

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Publ.-Id: 8172