Ion beam sensitized SiO2 surface for halide ions
Ion beam sensitized SiO2 surface for halide ions
Pham, T.; Matz, W.; Möller, W.; Hüller, J.
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Analytica Chimica Acta 320 (1996) pp. 289-291
DOI: 10.1016/0003-2670(95)00537-4
Cited 4 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-889