Ion beam sensitized SiO₂ surface for halide ions

Ion beam sensitized SiO₂ surface for halide ions

Pham, T.; Matz, W.; Möller, W.; Hüller, J.

• Analytica Chimica Acta 320 (1996) pp. 289-291
  DOI: 10.1016/0003-2670(95)00537-4
  Cited 4 times in Scopus

Permalink: https://www.hzdr.de/publications/Publ-889