Role of hydrogen ions in plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry
Role of hydrogen ions in plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry
von Keudell, A.; Jacob, W.; Fukarek, W.
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Applied Physics Letters 66 (1995) 11 pp. 1322-1324
DOI: 10.1063/1.113229
Cited 38 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-891