Roughness Improvement and Hardness Enhancement in Nanoscale Al/AlN Multilayered Thin Films
Roughness Improvement and Hardness Enhancement in Nanoscale Al/AlN Multilayered Thin Films
Wang, X.; Kolitsch, A.; Möller, W.
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Applied Physics Letters, 71 (14), 6 October 1997, 1951-1953
DOI: 10.1063/1.119752
Cited 39 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-922
Publ.-Id: 922