Improvement of the oxidation behavior of TiAl-alloys by treatment with halogens

The paper addresses the enhancement of the oxidation resistance of gamma-TiAl alloys with the aim of making them suitable for applications at temperatures in excess of 750 °C. Improvements in the oxidation resistance have been achieved by ion-implanting halogens, notably Cl and F, which favors the formation of an adherent protective alumina scale. Additional results are presented pertinent to the high-temperature creep behavior of the halogen-implanted alloys.