Ion-induced stress relaxation during magnetron sputtering deposition of cubic boron nitride thin films


Ion-induced stress relaxation during magnetron sputtering deposition of cubic boron nitride thin films

Abendroth, B.; Gago, R.; Eichhorn, F.; Kolitsch, A.; Möller, W.

There is no abstract provided.

  • Lecture (Conference)
    PSE2004, 13.-17.09.2004, Garmisch-Partenkirchen, Germany

Permalink: https://www.hzdr.de/publications/Publ-9815
Publ.-Id: 9815