Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Skorupa, W.; Yankov, R. A.; Anwand, W.; Voelskow, M.; Gebel, T.; Downey, D. F.; Arevalo, E. A.
The way how to fabricate ultra-shallow junctions by plasma doping and flash lamp annealing is demonstrated.
Keywords: ultra-shallow junctions; plasma doping; flash lamp annealing
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Lecture (Conference)
European Materials Research Society Spring Meeting, 24.-28.05.2004, Strasbourg, France
Permalink: https://www.hzdr.de/publications/Publ-9923
Publ.-Id: 9923