Ultra-shallow junctions produced by plasma doping and flash lamp annealing


Ultra-shallow junctions produced by plasma doping and flash lamp annealing

Skorupa, W.; Yankov, R. A.; Anwand, W.; Voelskow, M.; Gebel, T.; Downey, D. F.; Arevalo, E. A.

The way how to fabricate ultra-shallow junctions by plasma doping and flash lamp annealing is demonstrated.

Keywords: ultra-shallow junctions; plasma doping; flash lamp annealing

  • Lecture (Conference)
    European Materials Research Society Spring Meeting, 24.-28.05.2004, Strasbourg, France

Permalink: https://www.hzdr.de/publications/Publ-9923
Publ.-Id: 9923