4th International Workshop on High-Resolution Depth Profiling
Radebeul, Germany, June 17th - 21th , 2007



Invited Speakers:

1. Andreas Bergmaier, UBW Munich
"High Resolution ERD Channeling"

2. Dirk Boerma, UA Madrid
"Design and first test results of a wide-angle magnetic spectrograph of novel design"

3. Matt Copel, IBM
"Structural Characterization of Advanced CMOS Technology"

4. Lyudmila Goncharova, Rutgers University
"Gate metal-induced diffusion and interface reactions in metal oxide dielectrics"

5. Pedro Luis Grande
"An analytical energy-loss line shape for high depth resolution in ion-beam analysis"

6. Yoshiaki Kido and Tetsuaki Okazawa, Ritsumeikan University
"Au Nano-particles Grown on Oxide Substrates"

7. Kenji Kimura, Kyoto
"Depth profiling with high-resolution RBS: comparison and combination with other analytical techniques"

8. T. Kobayashi, RIKEN
"Analysis of nanostructures by using 3D-MEIS"

9. Dea Won Moon, KRISS
"The Effect of Strain on Interfacial Structures of Gate Dielectrics and Q-dots"

10. John Notte , Alis / Carl Zeiss
"An Introduction to Helium Ion Microscopy"

11. Thomas Osipowicz, Singapore
"High resolution RBS/channeling measurements of Si strain distributions below ITO and CuO ultrathin films"

12. Antonio Rivera, UA Madrid
"A high resolution LEIS facility for advanced surface studies"

13. Gregor Schiwietz, Berlin
"Non-equilibrium Charge States and Scattering Potentials in Ion-Solid Interactions"

14. Steve Tears, York
"The structure of 2- and 3-dimensional rare earth silicides on silicon studied by MEIS"

15. Helmut Winter, HU Berlin
"Interatomic potentials at surfaces from rainbow scattering and fast atom diffraction"

16. Phil Woodruff, Warwick
"Surface Structural Studies with MEIS"





contact: Rainer Grötzschel (r.groetzschel@fzd.de)