Structural properties of thin HfSiO films


Structural properties of thin HfSiO films

Teichert, S.; Muehle, U.; Fachmann, J.; Steinhoff, J.; Kudelka, S.; Wilde, L.; von Borany, J.; Eichhorn, F.

Kein Abstract vorhanden.

  • Lecture (Conference)
    11th International Conference on the Formation of Semiconductor Interfaces (ICFSI), 19.-24.08.2007, Manaus-Amazonas, Brazil

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