Oxidation-resistant TiAl alloys produced by plasma immersion ion implantation of fluorine

Gamma-TiAl alloys (γ-TiAl) are a class of light-weight materials that hold great promise for advanced automobile, aerospace and power generation applications. Their use, however, has currently been limited to below 700°C because of inadequate resistance to oxidation at higher temperatures. Recent research work has established that dramatic enhancement in the high-temperature oxidation resistance of these alloys can be achieved by ion implanting halogens, notably fluorine. In the present study, samples of technical γ-TiAl alloys have been surface-modified by plasma immersion ion implantation (PIII) of fluorine using suitable F-containing precursor gases. Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis and Auger Electron Spectrometry have been employed for sample characterization. The degree of oxidation protection has been assessed by testing F-implanted samples under conditions of isothermal oxidation in air at temperatures up to 1050°C. Optimum process parameters have been identified under which the modified alloys acquire a stable, adherent and highly protective alumina scale against high-temperature environmental oxidation.