Minimization of topological defects in ion-induced ripple patterns on silicon
Minimization of topological defects in ion-induced ripple patterns on silicon
Keller, A.; Facsko, S.; Möller, W.
The evolution of self-organized nanoscale ripple patterns induced by low energy ion sputtering of silicon was investigated. The quality of the patterns was monitored by calculating a normalized density of topological defects from atomic force microscopy images. A strong dependence of the normalized defect density on the applied ion fluence is observed with a well pronounced minimum at intermediate fluences. Simulations using the damped Kuramoto-Sivashinsky equation yield good agreement with the experiments and are further used to study the dynamics of single pattern defects.
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New Journal of Physics 10(2008), 063004
DOI: 10.1088/1367-2630/10/6/063004
Cited 37 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-10978