Spectral distribution of UV range diffuse reflectivity for Si+ ion implanted polymers

The analysis of the UV range spectral characteristics can supply additional
information on the formed sub-surface buried layer with implanted dopants. The near-surface
layer (50÷150 nm) of bulk polymer samples have been implanted with silicon (Si+) ions at low
energies (E=30 keV) and a wide range of ion doses (D=1.1013 ÷ 1,2.1017 cm-2). The studied
polymer materials were: ultra-high-molecular-weight polyethylene (UHMWPE), poly-methylmetacrylate
(PMMA) and poly-tetra-fluor-ethylene (PTFE). The diffuse optical reflectivity
spectra Rd = f(λ) of the ion implanted samples have been measured in the UV range (λ =
220÷350 nm). In this paper the dose dependences of the size and sign of the diffuse optical
reflectivity changes ΔRd = f(D) have been analysed.