Controlled Assembly and Nanoscale Doping of Epitaxial Si(Ge) Quantum Dot Nanostructures

Self-assembled Si(Ge) quantum dots (QDs) may prove useful in future nanoelectronic device architectures. For this, they must be spatially arranged in specific patterns and possess the electronic or magnetic properties required for device operation. Previous work demonstrated Ga+ focused ion beam (FIB) templating of Si surfaces prior to epitaxial growth for fabricating patterned QDs with any desired complexity.1, 2
Our current research employs a mass-selecting FIB to template QD structures and to individually dope them. Ion species can be selected according to isotope mass and charge state using a Wien filter. Working with suitable liquid metal alloy ion sources (LMISs) provides the means to template with electrically non-invasive ions (e.g. Si+ from AuSi), then implant dopant ions for electronic or magnetic activation (e.g. with B+ from AsPdB or Mn+ from GeMn), with resolution of tens of nm and doses down to a few ions per dot.