Si+ implantation induced photoluminescence enhancement in PMMA

Si+ ion implantation effects on the photoluminescence (PL) properties of polymethyl-methacrylate (PMMA) have been studied. Low-energy ion implantation (E=30÷50 keV) was carried out over a range of different ion doses (D=1013÷1017 cm-2). The observed effect of PL enhancement (PLE) is essentially dependent on the ion dose. For certain doses, the overall amplitude of the PL emission has a several times (~ 5 times) increase. Electron microscopy results and surface elemental analysis reveal implanted Si atoms clustering which could be related to the observed PLE effects.