Reactive Magnetron Sputtering of Nitrides and Oxides: Understanding the Process and Optimizing the Film Quality


Reactive Magnetron Sputtering of Nitrides and Oxides: Understanding the Process and Optimizing the Film Quality

Moeller, W.

kein Abstract vorhanden

  • Invited lecture (Conferences)
    Plasmas, Surfaces, and Thin Films, 11.06.2008, London, United Kingdom

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