Surface patterning by ion erosion – atomistic computer simulations

Surface ripple formation by low-energy ion erosion is a far-from-equilibrium process for which standard thermodynamics have to be put into question. Thus, an effective negative surface tension can be found under low-energy ion irradiation of surfaces [1] and ion beam mixing of interfaces [2]. This negative surface tension tends to increase the surface by inverse Ostwald ripening or surface patterning [2]. Here, for very low energy ion irradiation of surfaces patterning is predicted to evolve even without sputtering, resulting solely from defect creation and annihilation kinetics. Self-organisation of surface pattern by irradiation with ions in the region of keV-energies is strongly affected by sputtering, but even in that case far-from-equilibrium surface defect kinetic can play a major role. This will be underlined by a theoretical study of the temperature-dependent ripple formation found recently on Ag(110) [3]. In agreement with the experiment, kinetic Monte-Carlo calculations show that under ion irradiation at low temperatures (111) facets become unstable, resulting in a ripple rotation from (111) facets to (100) facets.