Local setting of magnetic anisotropy in amorphous films by Co ion implantation

The local setting of magnetic anisotropy by low fluence Co ion implantation in amorphous magnetic thin films is demonstrated. For a wide range of ion fluences no structural changes occur and the adjustment of anisotropy is reversible. A quantitative relationship between the anisotropy change and the atomic displacements is found. Magnetic domain investigations of the purely magnetically patterned stripes reveal an effective quasi-cubic anisotropy below a critical width for orthogonal magnetic anisotropy alignment. The method of ion-annealing allows for a local setting of anisotropy without irreversible structural and magnetic alterations.