Dynamic in Situ Diagnostics Using High-Energy Ion Beam Analysis

MeV ion beam analysis (IBA) is presented as a powerful tool for in situ, real-time process diagnostics. With minor additional experimental equipment such as diferential pumping or the installation of special detectors, dynamic stoichiometric profiles can be measured during ion beam or plasma exposure. Spectrum acquisition times of the order of a few minutes or less enable the study of fast and transient diffusion effects and transient surface coverages. Examples are given addressing the diffusion and trapping of hydrogen in nickel around room temperature, the ion beam synthesis of carbon±nitrogen films, the ion beam nitriding of stainless steel, and the diagnostics of the layered structure of cubic boron nitride films. The latter example combines stoichiometric in situ analysis using dynamic ERD and structural in situ analysis using optical ellipsometry.