Atomistic simulation of ion-erosion-induced surface patterning

Kinetic 3D lattice Monte-Carlo simulation of ion beam induced surface modification was performed for f.c.c. (100) surface and preliminary Crystal-TCAS calculations of 5keV As+ on Si(001) have been simulated. By KMC, the observed surface patterning was depending on the incidence angle even the direction of ion-induced surface atom displacement is arbitrary next lattice position. Angular dependency of the sputtering yield by the Crystal-TCAS calculation has been studied.