Highly dense amorphous Nb2O5 films with closed nano-sized pores
Highly dense amorphous Nb2O5 films with closed nano-sized pores
Vinnichenko, M.; Rogozin, A.; Grambole, D.; Munnik, F.; Kolitsch, A.; Möller, W.; Stenzel, O.; Wilbrandt, S.; Chuvilin, A.; Kaiser, U.
This study is focused on tailoring Nb2O5 film porosity during reactive pulsed magnetron sputtering. Dense amorphous films with closed nanopores have been formed onto unheated substrates at high growth rates. The films have a high refractive index n_400=2.54, a low extinction coefficient, k_400~6x10-4, a low mechanical stress (-90 MPa) and a negligible thermal shift. The specific depth distribution of the nanopores is believed to be the reason for the high film density combined with a low mechanical stress.
Keywords: reactive pulsed magnetron sputtering; high refractive index materials; Nb2O5; nano-sized pores; optical properties
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Applied Physics Letters 95(2009), 081904-1-081904-3
DOI: 10.1063/1.3212731
Cited 17 times in Scopus -
Lecture (Conference)
EMRS Spring Meeting, 08.-12.06.2009, Strasbourg, France
Permalink: https://www.hzdr.de/publications/Publ-12632