In-situ X-ray diffraction studies during deposition of Ni-Ti films

The deposition of Ni-Ti films with definite stoichiometry and high purity remains still a challenge. Furthermore, important issues like the formation of film texture and its control are not yet resolved. Near equiatomic (~ 50.0 at.% Ti¨CNi) and Ti-rich (~ 50.8 at.% Ti¨CNi) Ni-Ti polycrystalline films (thickness values ¡Ü 800 nm) have been deposited by magnetron co-sputtering using a chamber installed into the six-circle diffractometer of the Rossendorf beamline at the European Synchrotron Radiation Facility. The in-situ X-ray diffraction studies enabled the identification of different steps of the structural evolution during films processing. Films exhibiting a (100) preferential orientation for the B2 phase have been successfully produced. A continuous increase of the B2(200) diffraction peak intensity has been observed for depositions on a 140 nm amorphous SiO2 buffer layer heated at 520¡ãC (without substrate bias voltage, Vb). A (100) texture has been observed for films as thick as 800 nm. Films deposited without and with Vb on a TiN coating with a topmost layer formed by <111> oriented grains have shown a preferential growth of <110> oriented grains of the B2 phase from the beginning of the deposition. Those trends have been observed for the growth of near equiatomic and Ti-rich films.