Doping Issues of Si Nanowires
Doping Issues of Si Nanowires
Skorupa, W.
A review of recent work published in:
ADVANCED MATERIALS Volume: 22 Issue: 36 Pages: 4020-4024,
NANO LETTERS Volume: 10 Issue: 1 Pages: 171-175,
Keywords: Doping; ion implantation; scanning spreading resistance profiling; silicon nanowire
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
Related publications
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 14894) publication
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Invited lecture (Conferences)
27.Deutsches Nutzertreffen RTP und Heissprozesse, 05.05.2010, Erlangen, Deutschland
Permalink: https://www.hzdr.de/publications/Publ-14894
