Doping of Vertical Si Nanowires by Ion Implantation
Doping of Vertical Si Nanowires by Ion Implantation
Skorupa, W.
A review of recent work published in:
ADVANCED MATERIALS Volume: 22 Issue: 36 Pages: 4020-4024
NANO LETTERS Volume: 10 Issue: 1 Pages: 171-175
NANOSCALE RESEARCH LETTERS Volume: 5 Issue: 1 Pages: 243-246
Keywords: ion implantation; silicon nanowires; doping; scanning spreading resistance microscopy
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
Related publications
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 14897) publication
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Invited lecture (Conferences)
43.Deutsches Nutzertreffen Ionenimplantation, 06.05.2010, Erlangen, Deutschland
Permalink: https://www.hzdr.de/publications/Publ-14897
