Doping & Annealing Issues of Electronic Materials
Doping & Annealing Issues of Electronic Materials
Skorupa, W.
Overview on basics and advances in doping of semicondutors
Keywords: ion implantation; annealing; boron; phosphorus; arsenic; nanowires; diluted material; light emitter
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
Related publications
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 15038) publication
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Invited lecture (Conferences)
SPIRIT Tutorial "Ion Implantation and Irradiation", 13.-14.12.2010, Dresden, Deutschland
Permalink: https://www.hzdr.de/publications/Publ-15038
