Self-assembling of Ge quantum dots in an alumina matrix


Self-assembling of Ge quantum dots in an alumina matrix

Buljan, M.; Pinto, S. R. C.; Rolo, A. G.; Martin-Sanchez, J.; Gomes, M. J. M.; Grenzer, J.; Mücklich, A.; Bernstorff, S.; Holy, V.

In this work we report on a self-assembled growth of a Ge quantum dot lattice in a single 600-nm-thick Ge+Al(2)O(3) layer during magnetron sputtering deposition of a Ge+Al(2)O(3) mixture at an elevated substrate temperature. The self-assembly results in the formation of a well-ordered three-dimensional body-centered tetragonal quantum dot lattice within the whole deposited volume. The quantum dots formed are very small in size (less than 4.0 nm), have a narrow size distribution and a large packing density. The parameters of the quantum dot lattice can be tuned by changing the deposition parameters. The self-ordering of the quantum dots is explained by diffusion-mediated nucleation and surface-morphology effects and simulated by a kinetic Monte Carlo model.

Keywords: NANOCRYSTALS; NANOSTRUCTURES; SILICON; E(1)

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