Magnetic and defect-properties of Co implanted TiO2
Magnetic and defect-properties of Co implanted TiO2
Yildirim, O.; Cornelius, S.; Vinnichenko, M.; Butterling, M.; Wagner, A.; Smekhova, A.; Potzger, K.
The magnetic and structrual properties of the potential diluted magnetic oxide (DMO), i.e. Co implanted TiO2 thin films have been investigated. These films have been grown by magnetron sputtering on SrTiO3 single crystals. Avoidence of possible magnetic contamination has been verified by magnetometry measurements after substrate preparation and deposition. For magnetic doping, implantations of Co+ ions have been performed at atomic concentrations of 0.5%, 2.5% and 3% respectively. The dependencies between the fluence implanted, defect creation and ferromagnetic properties have been investigated using magnetometry, positron annihilation spectroscopy and structural characterisation.
This work is supported by the Initiative and Networking Fund of the German Helmholtz Association, Helmholtz-Russia Joint Research Group HRJRG−314, and the Russian Foundation for Basic Research, RFBR #12 − 02 − 91321 − 𝑆𝐼𝐺 − 𝑎
Keywords: Magnetic Semiconductors; Diluted Magnetic Oxides
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
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- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 18563) publication
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