Short time thermal processing and defects: history and ideology
Short time thermal processing and defects: history and ideology
Skorupa, W.
In this talk I will treat the fascinating world of defect engineering from the viewpoint of short time thermal processing in the millisecond range. Special focus will be devoted to ion implantation-related issues.
Keywords: millisecond range thermal processing; flash lamp annealing
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
Related publications
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 19743) publication
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Invited lecture (Conferences)
International Symposium on Semiconductors: Defects, Doping and Diffusion (IS2D3), 24.-25.10.2013, Oslo, Norway
Permalink: https://www.hzdr.de/publications/Publ-19743
