Microalloying effects in the oxidation of TiAl materials

The influence of microalloying on the oxidation behavior of gamma-TiAl based alloys was studied. The microalloying elements were added by ion implantation. Oxidation tests at 1173 K in air showed that the addition of chlorine into TiAl improves the oxidation resistance resulting in a decrease of the oxidation rate by about 2 orders of magnitude compared to unalloyed TiAl. Microstructural investigations revealed that the formation of an protective alumina layer on top of Cl-implanted TiAl is the cause for the decrease in the oxidation rate. AES measurements in the initial stage of oxidation showed that chlorine is located under the alumina layer in the metal phase. Thermodynamic calculations, investigations on the temperature dependence of the chlorine effect and the oxidation kinetics of preoxidized Cl-implanted samples support the model of a selective Al-transport via AlCl. Furthermore, the influence of small additions (in the ppm range) of P, B, C and Br on the oxidation kinetics of g-TiAl-based alloys has been investigated. P, B and C implanted TiAl showed a different oxidation behaviour and oxide scale microstructure compared to Cl and Br microalloyed TiAl. Especially the P implanted sample revealed an extensive nitride formation connected with a breakaway oxidation after 100 h.