Ferromagnetic InMnAs prepared by Ion implantation and pulsed laser annealing


Ferromagnetic InMnAs prepared by Ion implantation and pulsed laser annealing

Yuan, Y.; Wang, Y.; Khalid, M.; Weschke, E.; Skorupa, W.; Helm, M.; Zhou, S.

Ferromagnetic InMnAs has been previously prepared by low temperature MBE. In this contribution, we present an alternative method what combines Mn ion implantation and pulsed laser annealing to achieve In1-xMnxAs (x = 0.04 and 0.08) [1], and to obtain a remarkably high Curie Temperature (TC) up to 80 K compared to InMnAs with the same Mn concentration as prepared by MBE. The advantage of pulsed laser annealing is its high process temperature within the nano-second range, eliminating n-type defects which can decrease its magnetization and TC. The saturation magnetization is ~2.6μB / Mn by consideration of all implanted Mn ions. The out-of-plane [001] is the easy axis displaying a nearly square like hysteresis loop. Our results suggest that InMnAs prepared by ion implantation and pulsed laser annealing shows a promising prospect to get high TC DMS after optimizing the preparation parameters.

Keywords: Ferromagnetic Semiconductors; Ion Implantation; Pulsed laser annealing

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