Electronic structure and morphology of chromium oxide thin films grown by reactive pulsed magnetron sputtering


Electronic structure and morphology of chromium oxide thin films grown by reactive pulsed magnetron sputtering

Gago, R.; Vinnichenko, M.; Hübner, R.; Redondo-Cubero, A.; Vázquez, L.

Chromium oxide appears in different phases such as CrO (II), Cr2Or3 (III) CrO2 (IV), and CrO3 (VI); the number in brackets denoting the valence of the Cr atoms. This structural variety results in a wide range of applications. For example, Cr2O3 is the most stable oxide under normal conditions and exhibits high hardness and low friction, being used as protective coating in magnetic recording devices or solar absorber materials.1 CrO2 is a half-metallic ferromagnet and, therefore, good candidate for Spintronics.2 Finally, CrO3 is highly toxic, corrosive, and carcinogenic; but widely used in electroplating.3 Clearly, practical applications demand processing with a precise control of the phase formation. In this work, CrOx films were grown by pulsed magnetron sputtering with different Ar/O2 mixtures and substrate temperatures up to 500ºC. The samples were analyzed by Rutherford backscattering, ellipsometry, atomic force microscopy, transmission and scanning electron microscopies, X-ray diffraction and X-ray absorption spectroscopy. On unheated substrates, films exhibit X-ray amorphous character and a direct correlation between the O2 content in the gas, [O2], and the growth rate and stoichiometry. Remarkably, a range of mixed-valence oxides is observed, with higher valence Cr states promoted with [O2]. On the contrary, substrate heating favors Cr2O3 formation and, accordingly, single-phase nanocrystalline (nc) films are identified. The amorphous films are compact, displaying a surface morphological transition from granular-like to smooth with [O2]. Upon heating, the morphology develops into a porous fibrillar-like structure, as evidenced by empty voids between nc-Cr2O3 grains. These results show a clear correlation between the bonding structure and the microstructure of the different CrOx structures. REFs: 1 Hones et al. Surf. Coat. Technol. 120-121 (1999) 277; 2 Stewart et al. Phys. Rev. B 79 (2009) 144414; 3 Sarto et al. Carcinogenesis 3 (1982) 1011.

Keywords: chromium oxide; pulsed magnetron sputtering; phase formation; XANES; morphology

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