Carbon p Electron Ferromagnetism in Silicon Carbide


Carbon p Electron Ferromagnetism in Silicon Carbide

Wang, Y.; Liu, Y.; Wang, G.; Anwand, W.; Jenkins, C.; Arenholz, E.; Munnik, F.; Gordan, O.; Salvan, G.; Zahn, D. R. T.; Chen, X.; Gemming, S.; Helm, M.; Zhou, S.

Ferromagnetism can occur in wide-band gap semiconductors as well as in carbon-based materials, when specific defects are introduced. It is thus desirable to establish a direct relation between the defects and the resulting ferromagnetism. Here, we contribute to revealing the origin of defect-induced ferromagnetism using SiC as a prototypical example. We show that the long-range ferromagnetic coupling can be attributed to the p electrons of the nearest-neighbor carbon atoms around VSiVC divacancies. Thus, the ferromagnetism is traced down to its microscopic, electronic origin.

Keywords: SiC; Defect induced magnetism; XMCD

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