Theoretical description of high-temperature implantation of 6H-SiC with N+-and Al+-ions
Theoretical description of high-temperature implantation of 6H-SiC with N+-and Al+-ions
Kulikov, D. V.; Trushin, Y. V.; Yankov, R. A.; Pezoldt, J.; Skorupa, W.
- Techn. Phys. Lett. 24 (1998) 17
Permalink: https://www.hzdr.de/publications/Publ-2165