Highly charged ion induced nanostructures by strong electronic excitations

The formation of nanostructures on surfaces without bulk damage by slow highly charged ion (HCI) irradiation was studied intensively in recent years. Especially single HCI impact on ionic crystals revealed interesting new phenomena. On alkali halides, e.g. KBr or KCl, defect mediated desorption with corresponding yields of a few thousand desorbed atoms per ion was observed [1]. Associated structures are pits with a diameter of up to 20nm and a depth of only 1 or 2 monolayers. The HCI’s potential energy was identified as the driving force for the desorption process. On alkaline earth halides (CaF2), however, hillocks were observed and this process was linked to a solid-liquid phase transition after surpassing a certain potential energy threshold. Even before nanomelting occurs damage could be revealed by wet-chemical etching of the surface [2]. Since HCI interaction with surfaces involves electron capture from and electron emission to the surface, we compare here HCI induced structures to structures observed after low energy electron bombardment [3]. Electrons and HCIs produce strong electronic excitations at the surface and subsequent de-excitation by electron-phonon interaction leads to the structure formation. Thus, potential sputtering and HCI induced phase transitions result from electronic excitations (and subsequent de-excitation) in contrast to single charged ions in the nuclear sputtering regime. To study the neutralization process of HCI in more detail we present recent data on the transmission of HCI through ultra-thin materials.