Comprehensive real time characterization of AlTiO(x)N(y) thin films at high temperatures

AlTiN, AlTiO, and AlTiO(x)N(y) thin films were investigated in order to understand the influence of the oxygen to nitrogen ratio on the failure mechanisms at high temperatures. The thin films were deposited by cathodic vacuum arc and characterized in-situ following the methodology proposed for comprehensive environmental testing of optical properties in thin films using the HZDR cluster tool [1].
This multi-chamber material processing and analysis system enables the detailed analysis of the temperature dependence of composition, chemical bonding, and optical properties of thin films. The methodology combines the sequential study of the optical constants by spectroscopic ellipsometry, compositional analysis using ion beam analysis techniques and structure analysis by Raman spectroscopy. All characterizations of AlTiO(x)N(y) thin films were carried out in situ without sample exposure to undefined atmospheres. The samples were heated in vacuum from room temperature to 800°C inside the different chambers and in parallel, to elucidate the influence of the ambience on the degradation process. Moreover, ex-situ annealing in air was performed. Ellipsometry, Raman and ERDA results show the influence of the initial oxygen content in the sample with the inward diffusion of oxygen into the coating and the oxidation resistance at high temperatures.

[1] I. Heras, E. Guillén, R. Wenisch, M. Krause, R. Escobar Galindo, J.L. Endrino - Comprehensive environmental testing of optical properties in thin films. Procedia CIRP. 22 (2014) 271–276