Formation and characterisation of Si/SiO2 multilayer structures by oxygen implantation into silicon
Formation and characterisation of Si/SiO2 multilayer structures by oxygen implantation into silicon
Hatzopoulos, N.; Siapkas, D. I.; Hemment, P. L. F.; Skorupa, W.
- J. Appl. Phys. 80 (1996) 4960
Permalink: https://www.hzdr.de/publications/Publ-2315