Subsecond thermal processing with flash lamps: equipment and modelling issues

This contribution presents an overview of the complex technical aspects of flash-lamp-annealing-tools for thermal processing in the millisecond range used at the Helmholtz Research Center Dresden-Rossendorf (HZDR). It outlines that Flash Lamp Annealing (FLA) is established as a high-performance alternative to Rapid Thermal Annealing and Furnace Annealing when it comes to treatment of the most advanced thin layer and coating materials, thus enabling the fabrication of novel electronic structures and materials classes. It shows the unique variety of parameters the HZDR is able to provide for applications ranging from annealing of implanted Si and Ge, transparent conductive oxides, photovoltaic materials, silver and copper inks on various non-metal substrates to exceptional applications (roof tiles, watchcases). It explains, how crucial parameters, such as emission spectrum, energy density, and preheat temperature are monitored to provide a reliable reproducibility. Modelling aspects regarding temperature distribution and heat transport within the millisecond range will also be addressed. Furthermore, a summary will be given of characteristic features of our tools to convey the diversity of the fields of application and the enormous range of possible research.