Interconnection lines following the surface topography fabricated by writing focused ion beam implantation

The Rossendorf Focused Ion Beam IMSA-100 was used for writing Co-implantation over a topographical structure surface with a prtly controlled focus. After a subsequent annealing the resulting CoSi2 interconnection lines were analysed by SEM and electrical measurements. Also the influence of the depth of focus on the height of the surface contours as well as the resulting radial beam profiles were investigated.