Ultra-fast Thermal Processing for thin metallic films

Thermal processing in the ms range comprises modern, non-equilibrium annealing techniques which allow various material modifications at the surface without affecting the bulk. Flash lamp annealing (FLA) is one of the most diverse methods of short time annealing with applications ranging from the classical field of semiconductor doping to the treatment of polymers and flexible substrates. The presentation focuses on several FLA aspects which are important for thin film applications, especially for thin metallic films.