Defects and mechanical properties in weakly damaged Si ion implanted GaAs

Damage formation is investigated in GaAs implanted with 1 MeV Si ions to ion fluences from 3 × 10¹² to 5 × 10¹⁵ cm⁻² at room temperature. Under the conditions applied, amorphization of the implanted layers does not occur. The weakly damaged layers are studied by applying different experimental techniques including Rutherford backscattering spectrometry in channeling configuration, x-ray diffraction, in situ curvature measurement, optical subgap spectroscopy, and transmission electron microscopy. The results are evaluated and quantitatively connected with each other. Damage formation is described as a function of the ion fluence using a common defect evolution model. Point defects and defect clusters have to be taken into account in the ion fluence range of main interest up to 2 × 10¹⁵ cm⁻². Point defects contribute by a factor of about 8 more to both perpendicular strain and in-plane stress than defect clusters. When the concentration of point defects or the induced strain reaches a critical value, defect clusters form, which ensures that no further increase of perpendicular strain occurs. This reveals a clear driving force for cluster formation. The microstructure of the defect clusters cannot be determined from the results. As₃Ga₂ interstitial clusters are supposed. A remarkable decrease of the shear modulus of the implanted layers below the value of pristine GaAs by ≈ −35% is observed. Surprisingly, the change of shear modulus already sets in at a very low damage level of a few percent