Combined Magnetron Sputtering- and Flash Lamp Annealing- Tool for Thin Film Processing under Vacuum Conditions

Unintentional contaminations during the thin film processing can occur, wich can lead to serious quality and performance degradations. In this work a new tool is presented wich combines DC Magnetron Sputtering and the Flash Lamp Annealing technology. Both processes are performed under vacuum conditions, to keep the Oxygen and Hydrogen contamination of the film low.