Helium ion microscopy and its application to low fluence materials modification

Helium Ion Microscopy has become a standard imaging and nanofabrication technique in last decade. In my presentation I will introduce the technqiue and the underlying reasons for its exceptional capabilities. The latter include high lateral resolution, high depth of focus, ability to image insulating samples and exceptional nanofabrication capabilites. In the second part I will highlight selected applications of the method. This will include modification of 2D materials, magnetic materials and applications related to quantum technology. I will also allude on past and current developments in ion beam based analysis using the HIM.
[1] Hlawacek, G. & Gölzhäuser, A. (Eds.) Helium Ion Microscopy, Springer International Publishing, 2016.
[2] Hlawacek, G.; Veligura, V.; van Gastel, R. & Poelsema, B. Helium ion microscopy, J. Vac. Sci. Technol. B, 2014, 32, 020801