Plasma immersion ion implantation using a glow discharge source with controlled plasma potential

Plasma immersion ion implantation using a glow discharge source with controlled plasma potential

Ueda, M.; Gomes, G. F.; Berni, L. A.; Rossi, J. O.; Barroso, J. J.; Beloto, A. F.; Beloto, A. F.; Abramof, A. F.; Reuther, H.

A DC glow charge plasma source was used to implant various types of materials (Al, SS 304, Si) with nitrogen.

Keywords: plasma immersion ion implantation; Si; Al; stainless steel

  • Poster
    IBA-14 / ECAART-6, Dresden, 26.-30.7.1999

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