Using of light and heavy ion beams in modern FIBs


Using of light and heavy ion beams in modern FIBs

Mazarov, P.; Meyer, F.; Richter, T.; Pilz, W.; Bischoff, L.; Klingner, N.; Hlawacek, G.

The incident ion defines the interaction mechanism with the sample surface caused by the energy deposition and thus has significant consequences on resulting nanostructures [1]. Therefore, we have extended the FIB technology towards the stable delivery of multiple ion species by liquid metal alloy ion sources (LMAIS) [2].
These LMAIS provides single and multiple charged ion species of different masses. As an example we introduce the GaBiLi LMAIS [3]. Such “universal” source enables high resolution imaging with light Li ions and sample modification with Ga or heavy polyatomic Bi clusters, all coming from the same ion source. Light ions are of
increasing interest due to the available high resolution in the nanometer range and their special chemical and physical behavior in the substrate. We compare helium and neon ion beams from a helium ion microscope with beams such as lithium, boron, and silicon, obtained from a mass-separated FIB using a LMAIS with respect
to the imaging and milling resolution, as well as the current stability [4]. The bombardment of solids by poly-atomic (cluster) ions leads to nonlinear collision cascades in near-surface regions. In comparison with linear cascades by monoatomic ions, much higher energy deposition occurs up to local surface melting [5]. Here, we also report the study on the sputter yield of Si under the bombardment by atomic Bi+ and cluster Bin+ (n = 2-4) ions with the same specific energy related to one incidence single atom [6].
[1] P. Mazarov, V. Dudnikov, A. Tolstoguzov, Electrohydrodynamic emitters of ion beams, Phys. Usp. 63
(2020) 1219.
[2] L. Bischoff, P. Mazarov, L. Bruchhaus, and J. Gierak, Liquid Metal Alloy Ion Sources – An Alternative
for Focused Ion Beam Technology, Appl. Phys. Rev. 3 (2016) 021101.
[3] W. Pilz, N. Klingner, L. Bischoff, P. Mazarov, and S. Bauerdick, Lithium ion beams from liquid metal
alloy ion sources, JVSTB 37(2), Mar/Apr (2019) 021802.
[4] N. Klingner, G. Hlawacek, P. Mazarov, W. Pilz, F. Meyer, L. Bischoff, Imaging and Milling Resolution
of Light Ion Beams from HIM and Liquid Metal Alloy Ion Source driven FIBs, Beilstein J. Nanotechnol. 11
(2020) 1742.
[5] L. Bischoff, K.-H. Heinig, B. Schmidt, S. Facsko, and W. Pilz, Self-organization of Ge nanopattern under
erosion with heavy Bi monomer and cluster ions, Nucl. Instr. Meth. B 272 (2012) 198.
[6] A. Tolstogouzov, P. Mazarov, A. Ieshkin, S.Belykh, N. Korobeishchikov, V. Pelenovich, D.J. Fu,
Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific
kinetic energy on the sputter yield, Vacuum 188 (2021) 110188.

Keywords: liquid metal alloy ion source; FIB technology; nanostructures; poly-atomic ions

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