Plasmonic gratings from highly doped Ge1-y Sn (y) films on Si
Plasmonic gratings from highly doped Ge1-y Sn (y) films on Si
Berkmann, F.; Ayasse, M.; Schlipf, J.; Mörz, F.; Weißhaupt, D.; Oehme, M.; Prucnal, S.; Kawaguchi, Y.; Schwarz, D.; Fischer, I. A.; Schulze, J.
Plasmonic modes in metal structures are of great interest for optical applications. While metals such as Au and Ag are highly suitable for such applications at visible wavelengths, their high Drude losses limit their usefulness at mid-infrared wavelengths. Highly n-doped Ge1−ySny alloys are interesting possible alternative materials for plasmonic applications in this wavelength range. Here, we investigate the use of highly n-doped Ge1−ySny films grown directly on Si by molecular beam epitaxy with varying Sn-content from 0% up to 7.6% for plasmonic grating structures. We compare plasma wavelengths and relaxation times obtained from electrical and optical characterization. While theoretical considerations indicate that the decreasing effective mass with increasing Sn content in Ge1−ySny films could improve performance for plasmonic applications, our optical characterization results show that the utilization of Ge1−ySny films grown directly on Si is only beneficial if material quality can be improved.
Keywords: GeSn; plasmonics; doping
Involved research facilities
- Ion Beam Center DOI: 10.17815/jlsrf-3-159
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- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 34212) publication
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Journal of Physics D: Applied Physics 54(2021), 445109
DOI: 10.1088/1361-6463/ac1f51
Cited 3 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-34212